Protective mask for pellicle
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United States of America Patent
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-
Sep 26, 1995
Grant Date -
N/A
app pub date -
Sep 22, 1994
filing date -
Sep 22, 1994
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A protective mask is provided for use with a pellicle which is mounted to a photomask during photolithography, with a light source being directed toward the photomask. The pellicle includes a pellicle membrane mounted to a pellicle frame by a first adhesive layer and with the pellicle frame being mounted to the photomask by a second adhesive layer. The protective mask is fabricated of an opaque material and is positioned between the light source and the two adhesive layers to shield them from the light source.
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