Lithographic electron-beam exposure apparatus and methods
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United States of America Patent
Stats
-
Oct 3, 1995
Grant Date -
N/A
app pub date -
Apr 28, 1993
filing date -
Apr 28, 1993
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus for exposing a radiation sensitive workpiece to define patterns therein includes an electron gun, a mask with spaced apertures for passing electron radiation, and a radiation deflector-blanker to direct the radiation to selected ones of the apertures and to form separate beamlets from the apertures then demagnify the separate beamlets and direct them onto the workpiece without crossing them. In one embodiment, the groups of apertures are fixed on the mask and define fixed undivided profiles in the path of the radiation.
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