Jet plasma process and apparatus
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United States of America Patent
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Nov 7, 1995
Grant Date -
N/A
app pub date -
Aug 16, 1994
filing date -
Aug 16, 1994
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A process and apparatus for the plasma deposition of a carbon-rich coating onto a substrate is provided. This method includes the steps of: providing a substrate in a vacuum chamber; and generating a carbon-rich plasma in the vacuum chamber by injecting a plasma gas into a hollow cathode slot system containing a cathode made of two electrode plates arranged parallel to each other, providing a sufficient voltage to create and maintain a carbon-rich plasma in the hollow cathode slot system, and maintaining a vacuum in the vacuum chamber sufficient for maintaining the plasma. The plasma is deposited on the substrate to form a carbon-rich coating.
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