PH adjusted nonionic surfactant-containing alkaline cleaner composition for cleaning microelectronics substrates
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United States of America Patent
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Nov 14, 1995
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N/A
app pub date -
Apr 20, 1994
filing date -
Apr 20, 1994
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Abstract
Aqueous alkaline cleaning solutions for cleaning microelectronic substrates and maintaining substrate surface smoothness comprise a metal ion free base, a nonionic surfactant and a component to reduce or control the pH of the cleaning solution to a pH within the range of from about pH 8 to about pH 10.
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