Stacked capacitor process using BPSG precipitates

United States of America Patent

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Nov 14, 1995
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N/A
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Mar 18, 1994
filing date
Mar 18, 1994

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Expired

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Abstract

A MOST capacitor for use in a DRAM is formed by using BPSG precipitates after densification as a mask for etching a BPSG layer to form BPSG islands. The BPSG islands are then used as a mask for etching a polysilicon layer to form pillars in the polysilicon layer.

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Patent Owner(s)

Patent Owner	Address
UNITED MICROELECTRONICS CORPORATION	NO 3 LI-HSIN RD II SCIENCE-BASED INDUSTRIAL PARK HSINCHU

International Classification(s)

H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Chin, Hsiaw-Sheng	Bann-Chyau, TW	1	16
Lin, Jenn-Tarng	Wann Hwa Area, TW	15	201
Lur, Water	Taipei, TW	199	4799

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Stacked capacitor process using BPSG precipitates

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United States of America Patent

08214608

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PATENT NO	5466627
SERIAL NO	08214608
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08214608

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