Apparatus and method for spreading resist on a wafer and detecting bubbles in the resist
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United States of America Patent
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-
Nov 28, 1995
Issued Date -
N/A
app pub date -
Jul 5, 1994
filing date -
Apr 8, 1993
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A station for coating a semiconductor wafer with a photoresist is provided with a detector for bubbles that may occur in the resist that is supplied to the wafer. The resist is carried to the coating apparatus by a plastic tube. A commercially available capacitance detector is positioned to detect the dielectric constant of the combination of the tube, the resist, and any bubbles in the resist. The dielectric constant of the bubbles is lower than the dielectric constant of the resist, but the difference is not sufficient for detecting the bubbles with the capacitance detector alone. A metal backing plate is located on the side of the tube opposite the detector and enhances the operation of the detector sufficiently to detect bubbles of various sizes.
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