Processing method and apparatus thereof
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United States of America Patent
Stats
-
Dec 12, 1995
Grant Date -
N/A
app pub date -
Oct 20, 1993
filing date -
Oct 23, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The present invention relates to a processing chamber that processes an object to be processed in an atmosphere of a processing gas. The processing chamber is provided with a mounting stand having a holder mechanism that holds the object to be processed within the processing chamber. The mounting stand is connected to a rotational mechanism and is free to rotate, and the holder mechanism on the mounting stand is also provided with a separate, independent rotational mechanism whereby the front surface and rear surface of the object to be processed can be rotated (inverted) relative to the mounting stand. Thus the present invention provides a processing method and apparatus therefor in which the front surface and rear surface of the object to be processed can be processed under the same conditions, without having to change the atmospheric status of the object to be processed.
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