Method of forming a liquid crystal display device

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United States of America Patent

PATENT NO 5474942
SERIAL NO

08237521

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Improved thin film transistors resistant to photo-induced current and having improved electrical contact between electrodes and the source or drain regions are provided. The thin film transistors formed in accordance with the invention are particularly well suited for use in an active matrix substrate for a liquid crystal display panel. The liquid crystal display panels include an additional insulating layer formed between crossing orthogonal source lines and gate lines to provide a higher breakdown voltage between the source lines and gate lines than at the gate insulating layer of the thin film transistors.

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Patent Owner(s)

  • SEIKO EPSON CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kodaira, Toshimoto Suwa, JP 16 639
Mano, Toshihiko Suwa, JP 15 565
Oshima, Hiroyuki Suwa, JP 98 2168

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