CVD diamond growth on hydride-forming metal substrates
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United States of America Patent
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Dec 26, 1995
Issued Date -
N/A
app pub date -
Mar 29, 1995
filing date -
Dec 13, 1991
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Expired
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Abstract
A method for producing CVD diamond film on a substrate comprised of a hydride-forming metal. The substrate provides for easy release of the CVD diamond coating formed thereon upon exposure to a hydrogen pressure. Self-supporting CVD diamond films of large dimension are easily obtained without dissolving the substrate. The substrate can be used in conventional CVD reactors.
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