Optical device with substrate and waveguide structure having thermal matching interfaces
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United States of America Patent
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Jan 9, 1996
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N/A
app pub date -
Aug 16, 1994
filing date -
Aug 16, 1994
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Abstract
The present invention provides polarization-independent optical devices by reducing or eliminating strain-induced birefrigence associated with prior device structures. In a first embodiment, an optical device is produced comprising a doped silica substrate having a coefficient of thermal expansion between 8.times.10.sup.-7 .degree. C..sup.-1 and 15.times.10.sup.-7 .degree.C..sup.-1. On the doped silica substrate is formed a doped silica waveguiding structure having a coefficient of thermal expansion between 8.times.10.sup.-7 .degree. C..sup.-1 and 15.times.10.sup.-7 .degree. C..sup.-1. Alternatively, the coefficient of thermal expansion of the doped silica substrate is selected to be approximately 90% to 110% of the coefficient of thermal expansion of the doped silica waveguiding structure. In another aspect, the present invention provides an optical device comprising a doped silica substrate having a doping gradient from a lower surface to an upper surface. The doping level at the upper surface has a coefficient of thermal expansion approximating the coefficient of thermal expansion of a doped silica waveguiding structure formed thereon.
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