Method and device for treatment of products in gas-discharge plasma
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United States of America Patent
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Apr 2, 1996
Grant Date -
N/A
app pub date -
Dec 13, 1993
filing date -
Apr 29, 1991
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for treatment of products in gas-discharge plasma consists in that a two-step vacuum-arc discharge is initiated between an anode (3) and an integrally cold cathode (2), featuring a metal-gaseous step of plasma and a gaseous step of plasma. The gaseous step of plasma is established by ionizing the working gas with electrons separated from the metal-gaseous step of plasma. Then a product (5) under treatment is preheated to working temperature and held in a preset temperature range. To this end, provision is made in the device for a means (13) for electron separation from the metal-gaseous step of plasma, which means is situated in the zone of the integrally cold cathode (2) and is impermeable to the metal ions generated by the cathode (2). In a particular case the means (13) is made as a set of V-shaped plates (14).
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