Apparatus and method for analyzing particles deposited on a substrate using substantially continuous profile data
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United States of America Patent
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Apr 2, 1996
Grant Date -
N/A
app pub date -
Oct 13, 1993
filing date -
Oct 13, 1993
priority date (Note) -
Expired
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Abstract
An apparatus for analyzing particles collected from a fluid and deposited on a substrate along a given direction, the apparatus including holding structure for supporting the substrate; a radiation source for directing radiation toward the particles on the substrate; and a radiation detector for receiving radiation incident upon the particles on the substrate and for providing an output based on the concentration of the particles, the radiation detector being cooperative with the radiation source to output substantially continuous profile data indicative of the concentration of said particles along the given direction.
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