Stereolithography using vinyl ether based polymers
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United States of America Patent
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Apr 9, 1996
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N/A
app pub date -
Apr 20, 1994
filing date -
Feb 27, 1991
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Abstract
Polymer precursor formulations suitable for stereolithography may be prepared from compositions containing (a) a vinyl ether oligomer, and (b) mono and/or multifunctional vinyl ether monomers.
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