Stereolithography using vinyl ether-epoxide polymers

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United States of America Patent

PATENT NO 5510226
SERIAL NO

08230444

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Abstract

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Polymer precursor formulations suitable for stereolithography may be prepared from compositions containing vinyl ether functionalized compounds and epoxy functionalized compounds plus an effective amount of a cationic photoinitiator.

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Patent Owner(s)

Patent OwnerAddress
3D SYSTEMS INC333 THREE D SYSTEMS CIRCLE ROCK HILL SC 29730

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lapin, Stephen C Wauconda, IL 36 510
Sitzmann, Eugene V Elk Grove Village, IL 10 232
Snyder, James R Chicago, IL 11 314

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