Pressure pulse cleaning
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 7, 1996
Grant Date -
N/A
app pub date -
Dec 9, 1992
filing date -
Dec 9, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The present invention is a method which relies on pressure pulse cleaning. By 'pressure pulse cleaning' it is meant that the pressure and temperature of a fluid, such as carbon dioxide is raised to near or above supercritical conditions, which is then contacted with the item(s) to be cleaned. Periodically, the pressure of the supercritical fluid is pulsed or spiked to higher levels and returned to substantially the original level. Potential candidates for treatment by the present invention include but are not limited to precision parts such as gyroscopes used in missile guidance systems, accelerometers, thermal switches, nuclear valve seals, electromechanical assemblies, polymeric containers, special camera lenses, laser optics components, and porous ceramics.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully