Infrared ray cutoff material and infrared cutoff powder use for same

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United States of America Patent

PATENT NO 5518810
SERIAL NO

08268912

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Abstract

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An infrared-ray cutoff material having a structure in which tin-doped indium oxide powder (ITO) powder is dispersed in an inorganic or organic matrix. The material can be in the form of a coating on a substrate available by applying a composition comprising ITO powder, a binder (an organic resin and/or a metal alkoxide) and a solvent (an organic solvent, water and/or alcohol) onto the substrate and drying the same. It may also be in the form of a film, a sheet, a fiber or other shape available by forming a composition made by dispersing ITO powder in an organic polymer. The ITO powder should preferably have an x-value of from 0.220 to 0.295 and a y-value of from 0.235 to 0.352 on the xy chromaticity scale, a lattice constant of from 10.110 to 10.160 .ANG., and a minimum cutoff wavelength of up to 1,000 nm. The infrared-ray cutoff material of the present invention is transparent within the visible region and can totally cut off infrared rays of wavelengths ranging from relatively shorter ones.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI MATERIALS CORPORATION2-3 MARUNOUCHI 3-CHOME CHIYODA-KU TOKYO 1008117 ?1008117

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hayashi, Toshiharu Omiya, JP 37 639
Nishihara, Akira Omiya, JP 18 309
Sekiguchi, Masahiro Omiya, JP 25 319

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