Method of processing a photosensitive material and photosensitive material processor

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United States of America Patent

PATENT NO 5518844
SERIAL NO

08318338

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Abstract

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In a first processing step, whether a first photosensitive material is a particular photosensitive material is detected. If it is detected at least that the first photosensitive material is the particular photosensitive material, processing conditions in the first processing step are recorded in a predetermined position on the first photosensitive material. Exposure conditions in the exposure step are set in accordance with one of the result of the detection and the processing conditions recorded on the first photosensitive material. The second photosensitive material is exposed under the set exposure conditions. If the first photosensitive material is detected to be a particular photosensitive material, the setting of the exposure conditions is changed in the exposure step, and the exposure conditions are set in such a manner as to compensate the difference in the characteristic occurring in the image of the particular first photosensitive material depending on standard processing and particular processing. Accordingly, even in the case of a photosensitive material requiring particular processing, it is possible to form an image of fixed quality.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATIONTOKYO 106-8620

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Matsumoto, Nobuo Kanagawa, JP 69 852
Nishikawa, Toshihiro Kanagawa, JP 36 360

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