High speed pump for a processing vacuum chamber

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5520002
SERIAL NO

08382386

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A high speed pumping apparatus for efficiently and rapidly evacuating a processing chamber to a desired vacuum pressure includes a pump chamber for coupling to the processing chamber and a cryogenic element in the pump chamber to absorb gas particles. The cryogenic element is movable within the pump chamber and has a first position inside the pump chamber and removed from the processing chamber. When the cryogenic element is in the first position, a sealing structure seals the aperture between the pump chamber and the processing chamber. The cryogenic element is movable, through the aperture, to a second position at least partially out of the pump chamber and inside the processing chamber. When in the second position inside of a processing chamber, the cryogenic element absorbs gas particles within the processing chamber and evacuates the chamber to a vacuum pressure. Thereby, the cryogenic element may be exposed to the processing chamber to evacuate the processing chamber and may subsequently be withdrawn into the pump chamber and sealed therein to be protected when the processing chamber is opened to atmospheric pressure.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
SONY CORPORATION1-7-1 KONAN MINATO-KU TOKYO 1080075 ?1080075
SONY ELECTRONICS INC1 SONY DRIVE PARK RIDGE NJ 07656

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishikawa, Hiroichi Kanagawa, JP 34 1342

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation