Antimicrobial polymer, contact lens and contact lens-care articles

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5520910
SERIAL NO

08397055

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An antimicrobial polymer obtained by homo- or copolymerizing a phosphonium salt type vinyl monomer, such as 2-(methacrylic acid) ethyltri-n-octylphosphonium chloride, and a contact lens and an article for its care mainly comprising an antimicrobial resin obtained by copolymerizing a polymerizable monomer and a phosphonium salt type vinyl monomer are disclosed. The antimicrobial polymer has a broad antimicrobial spectrum and produces a sufficient antimicrobial effect after a short contact time. The contact lens and article for its care are hardly effected by contamination with microorganisms while retaining excellent optical performance and processability.

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Patent Owner(s)

  • NIPPON CHEMICAL INDUSTRIAL CO., LTD.;SEIKO EPSON CORPORATION;NIPPON CHEMICAL INDUSTRIAL

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hashimoto, Kazukichi Tokyo, JP 1 26
Inaba, Yoshiko Tokyo, JP 1 26
Kojima, Tadao Suwa, JP 14 109
Mogami, Takao Suwa, JP 12 596
Shimura, Seiji Tokyo, JP 14 215
Ushiyama, Yoichi Suwa, JP 1 26

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