Importance

Loading Importance Indicators...

Abstract

A method for producing durable embossing tools is disclosed. An anisotropic etching process, such as ion etching, is used to etch a relief pattern into a hard substrate. A transfer layer is formed overlaying a generally smooth, seamless surface region of a substrate. A desired relief pattern is formed in the transfer layer, by exposing a photoresist, embossing, or the like. The substrate having the photoresist thereon is subjected to an anisotropic etch. The anisotropic etch continues until the transfer layer is completely removed and the relief pattern is formed in the upper surface of the embossing tool. The relative etch rates between the transfer layer and the surface region of the embossing tool are selected to provide the desired depth modulation in the surface of the embossing tool. An embossing tool produced according to the invention has a relatively hard surface and may thus be used for the mass production of holographic images without significant degradation of the pattern. Because the embossing tool can be made from an extremely hard material such as chromium or hardened steel, materials which previously could not be economically embossed with holograms, such as aluminum or steel, may now be embossed by an embossing tool made according to this invention.

Loading the Abstract Image...

First Claim