Particle-free microchip processing
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United States of America Patent
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Jun 4, 1996
Grant Date -
N/A
app pub date -
May 19, 1994
filing date -
May 19, 1994
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Method and apparatus for reducing particulate contamination in microchip processing are disclosed. The method and apparatus comprise means to reduce particle velocity toward the wafer before the particles can be deposited on the wafer surface. A reactor using electric fields to reduce particle velocity and prevent particulate contamination is disclosed. A reactor using a porous showerhead to reduce particle velocities and prevent particulate contamination is disclosed.
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