Process for producing a silicon oxide deposit on the surface of a metallic or metallized polymer substrate using corona discharge at pressures up to approximately atmospheric
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United States of America Patent
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Jun 4, 1996
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N/A
app pub date -
Mar 10, 1995
filing date -
Jun 17, 1992
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Abstract
A process for producing a silicon oxide deposit at the surface of a metallic substrate comprising the following steps performed either concomitantly or successively: (1) treating the surface of the substrate with a corona discharge; and (2) exposing the surface to an atmosphere containing a silicon compound in the gaseous state. Both steps (1) and (2) are conducted at a pressure greater than 10,000 Pa. This process can be used to provide anti-corrosion treatment to a metallic substrate or to a metallized polymeric support.
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