Importance

Loading Importance Indicators...

Abstract

In order to obtain mask data for forming multiple metal-interconnection layers on a substrate, a plurality of rectangle patterns are generated which are respectively centered at cross points defined by straight lines that cross over each other at right angles. Further, a plurality of interconnection patterns are generated which are to be formed on the substrate. Subsequently, the rectangle and interconnection patterns are superimposed. The superimposed patterns include a plurality of continuous patterns in addition to the rectangle patterns. Then, the continuous patterns are extracted from the superimposed patterns, after which the rectangle patterns are extracted from the above mentioned superimposed patterns using the extracted continuous patterns. Finally, the extracted rectangle patterns are superimposed on the interconnection patterns. Thus, mask data indicative of the secondly superimposed patterns are determined.

Loading the Abstract Image...

First Claim