Semiconductor contact that partially overlaps a conductive line pattern and a method of manufacturing same
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United States of America Patent
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Jun 25, 1996
Issued Date -
N/A
app pub date -
Apr 14, 1995
filing date -
Dec 2, 1992
priority date (Note) -
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status (Latency Note)
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Abstract
A contact of a semiconductor device has an interlayer-insulating film sandwiched between upper and lower conductive line patterns, a conductive pad for electrically connecting the upper and lower conductive line patterns via a contact hole formed in the interlayer-insulating film to expose the lower conductive line pattern to the upper conductive line pattern, and a barrier material pattern formed on the upper conductive line pattern and conductive pad to partially overlap the conductive pad with the upper conductive line pattern, so that the lower and upper conductive line patterns on both sides of the interlayer-insulating film partially overlap with each other without damaging the lower conductive line pattern, thereby improving packing density of the semiconductor device. Also, a manufacturing method of the contact is provided.
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