Importance

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Abstract

In a gas deposition apparatus including: an ultra fine particle evaporation chamber; an evaporation source arranged in the ultra fine particle evaporation chamber; a deposition chamber; a substrate arranged in the deposition chamber; a transfer pipe connecting the ultra fine particle evaporation chamber with the deposition chamber; an inlet port of the transfer pipe indirect facing relationship to the evaporation source in the ultra fine particle evaporation chamber and an outlet port of the transfer pipe being in the deposition chamber; a nozzle connected to the outlet port of the transfer pipe, facing the substrate in the deposition chamber; and an introducing port for introducing inert gas into the ultra fine particle evaporation chamber wherein ultra fine particles are evaporated from the evaporation source by heating the latter. The particles are transported together with inert gas through the transfer pipe and they are ejected out from the nozzle onto the substrate to form a film or condensate of ultra fine particles thereon. In order to heat the transfer pipe, a DC power source is connected to the transfer pipe and a seethe heater is wound on the nozzle.

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First Claim