Method of exposing a light sensitive material
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United States of America Patent
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Jul 23, 1996
Issued Date -
N/A
app pub date -
Jun 7, 1995
filing date -
Jun 16, 1994
priority date (Note) -
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status (Latency Note)
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Abstract
A phase shift illuminator (700) is comprised of a light source (704) and a phase modulator (716), typically a flexure beam micromirror array, which transversely modulates the incident light beam. When a flexure beam micromirror array is used as the phase modulator (716) a polarizing beam splitter (712) and a quarter-wave plate (714) are used to separate the incident and reflected light beams. The phase modulated light beam (720) from the optical illuminator may be used in optical lithography by passing the light beam through a lithography mask (724), typically after the light beam is phase modulated, and focusing the light beam onto a target wafer (726).
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