Process for preparing crystalline ceric oxide
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United States of America Patent
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Aug 6, 1996
Grant Date -
N/A
app pub date -
Jun 15, 1995
filing date -
Jul 11, 1994
priority date (Note) -
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Abstract
The present invention is to provide a process for preparing ceric oxide particles used as an abrasive or polishing material for producing semiconductors or as a UV ray-absorbing material for plastics, glass and the like. The present invention relates to a process for preparing cerium (IV) oxide particles having a particle size of from 0.03 .mu.m to 5 .mu.m, which comprises adjusting an aqueous medium containing cerium (IV) hydroxide and a nitrate to a pH of from 8 to 11 with an alkaline substance and heating the aqueous medium at a temperature of from 100.degree. to 200.degree. C. under pressure.
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