Importance

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Abstract

A CAD system designs mask patterns for use in a master slice integrated circuit processing. The system includes an input device such as a mouse interface, and a display unit for symbolically displaying circuit elements and cells. A first data base stores a net list of circuit design information. A second data base stores data relating to the structure of a master slice bulk and various types of elemental cells formed in the master slice. A processing unit of the CAD system causes the display unit to display both a circuit design scheme and the master slice bulk on a screen of the display unit. The processing unit produces data about the initial positions of a pair of contact hole patterns by which a resistor is defined in a resistive cell region of the master slice, and automatically shifts the contact hole patterns from the initial positions to another position, in order to avoid interference between a wiring pattern on the master slice bulk and the contact hole patterns.

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First Claim