Developing method and apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 10, 1996
Grant Date -
N/A
app pub date -
Jan 27, 1995
filing date -
Feb 17, 1994
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A desired pattern is exposed to a substrate surface having a photosensitive resin film formed thereon, and thereafter a prewetting liquid and a developer are successively supplied to the substrate surface. A diaphragm mounted in a prewetting liquid supply nozzle applies ultrasonic vibration to the prewetting liquid to be supplied to the substrate surface. The ultrasonic vibration applied vibrates minute bubbles of several micrometers in size which are generated when the prewetting liquid is supplied to the substrate surface, thereby causing the bubbles to float to the surface of the prewetting liquid and disappear therefrom. As a result, the substrate surface is modified to be hydrophilic and becomes free of the bubbles. The developer subsequently supplied through a developer supply nozzle uniformly spreads over the entire substrate surface without being obstructed by the bubbles, to avoid non-uniform development.
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Cited Art Landscape
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