Aqueous cleaning method and composition with nonionic surfactants for removing water soluble flux
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United States of America Patent
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Sep 24, 1996
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N/A
app pub date -
Feb 21, 1995
filing date -
Feb 21, 1995
priority date (Note) -
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Abstract
A cleaning composition for removing water soluble flux residues from circuit assemblies comprises a surfactant formulation containing three nonionic surfactants which have cloud points which differ by at least 5.degree. F. from each other so as to provide optimum cleaning performance over a broadened temperature range. The surfactant formulation is preferably in the form of an aqueous concentrate which further contains alkaline salts, a corrosion inhibitor, a carboxylated polymer stabilizer to maintain the corrosion inhibitor in solution and a hydrotrope to maintain the surfactants in solution.
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