Deep ultraviolet optical imaging system for microlithography and/or microfabrication
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United States of America Patent
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Sep 24, 1996
Grant Date -
N/A
app pub date -
Oct 4, 1994
filing date -
Oct 4, 1994
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for the purpose of photolithography, surface cleaning, microstructuring, pattern microimaging, surface modification or the like, the delivery system including a deep UV radiation source for generating a beam of narrow wavelength deep ultraviolet radiation along a path, a first optical system in the path for homogenizing and shaping the deep UV energy in the path; and a second optical system in the path for directing radiation energy onto the surface of a substrate to be processed, the second optical system including large area mirror structure having a numerical aperture of at least 0.3 and a modular compensation assembly of refractive elements disposed between said large area mirror structure and said substrate and corresponding to the wavelength of the radiation source for compensating (reducing) image curvature introduced into the system by the large area mirror structure.
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