Exposure apparatus
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United States of America Patent
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Sep 24, 1996
Issued Date -
N/A
app pub date -
Jan 30, 1995
filing date -
Mar 8, 1993
priority date (Note) -
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status (Latency Note)
Importance
Abstract
An exposure apparatus is for illuminating a pattern on a mask by an illumination optical system to transfer the pattern on the mask onto a photosensitive substrate set on a stage through a projection optical system. The exposure apparatus comprises a first supply device for supplying an inert gas toward the photosensitive substrate substantially in parallel with the optical axis of the projection optical system in a space open to communicate with the atmosphere between the projection optical system and the photosensitive substrate, and a second supply device for supplying the inert gas to the space in a direction intersecting with the optical axis of the projection optical system so as to establish an inert gas atmosphere in the space together with the first supply device. The transfer is conducted in the inert gas atmosphere.
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