Centrifugal wafer carrier cleaning apparatus
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United States of America Patent
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-
Oct 8, 1996
Issued Date -
N/A
app pub date -
Feb 21, 1995
filing date -
Jun 15, 1992
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Apparatus (20) for cleaning carriers used to hold semiconductor wafers, substrates, data disks, flat panel displays and similar containers used in applications highly sensitive to contamination. The apparatus has a processing bowl (21) with entrance and exit ports (34, 36) through which carriers are installed and removed from processing chamber (21). Rotor (70) rotates within the processing chamber. Rotor (70) includes a rotor cage (71) which mounts detachable wafer carrier supports (214). Filtered, heated air is passed through the process chamber for drying. Cleaning liquid and additional drying gas can be supplied through manifolds (120, 110) positioned inside and outside rotor cage (71).
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