Multi mask method for selective mask feature enhancement
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United States of America Patent
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-
Oct 8, 1996
Grant Date -
N/A
app pub date -
Jun 30, 1994
filing date -
Jun 30, 1994
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The preferred embodiment of the present invention is a method of enhancing normally unenhanced features types. Pattern shapes are placed on two or more relatively simple, modified masks instead of using a single mask containing diverse feature types. On these modified masks, (hereinafter 'overlay masks'), all of the features are the type normally enhanced. A composite pattern is printed into photoresist through successive exposure to the overlay masks.
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