| 6,264,812 Method and apparatus for generating a plasma
|
47 |
1995
|
| 6,254,737 Active shield for generating a plasma for sputtering
|
5 |
1996
|
| 6,190,513 Darkspace shield for improved RF transmission in inductively coupled plasma sources for sputter deposition
|
29 |
1997
|
| 6,103,070 Powered shield source for high density plasma
|
10 |
1997
|
| 6,579,426 Use of variable impedance to control coil sputter distribution
|
6 |
1997
|
| 6,345,588 Use of variable RF generator to control coil voltage distribution
|
13 |
1997
|
| 6,565,717 Apparatus for sputtering ionized material in a medium to high density plasma
|
2 |
1997
|
| 6,297,595 Method and apparatus for generating a plasma
|
37 |
1998
|
| 6,228,229 Method and apparatus for generating a plasma
|
20 |
1998
|
| 6,132,566 Apparatus and method for sputtering ionized material in a plasma
|
10 |
1998
|
| 6,277,251 Apparatus and method for shielding a dielectric member to allow for stable power transmission into a plasma processing chamber
|
4 |
2000
|
| 7,094,316 Externally excited torroidal plasma source
|
7 |
2000
|
| 6,551,446 Externally excited torroidal plasma source with a gas distribution plate
|
40 |
2000
|
| 6,494,986 Externally excited multiple torroidal plasma source
|
33 |
2000
|
| 6,453,842 Externally excited torroidal plasma source using a gas distribution plate
|
37 |
2000
|
| 6,939,434 Externally excited torroidal plasma source with magnetic control of ion distribution
|
18 |
2002
|
| 7,430,984 Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements
|
1 |
2002
|
| 7,700,465 Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage
|
3 |
2003
|
| 7,320,734 Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage
|
4 |
2003
|
| 7,303,982 Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage
|
13 |
2003
|
| 7,137,354 Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage
|
12 |
2003
|
| 7,037,813 Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage
|
22 |
2003
|
| 6,893,907 Fabrication of silicon-on-insulator structure using plasma immersion ion implantation
|
37 |
2004
|
| 7,358,192 Method and apparatus for in-situ film stack processing
|
1 |
2004
|
| 7,223,676 Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer
|
7 |
2004
|
| 7,695,590 Chemical vapor deposition plasma reactor having plural ion shower grids
|
1 |
2004
|
| 7,291,360 Chemical vapor deposition plasma process using plural ion shower grids
|
6 |
2004
|
| 7,244,474 Chemical vapor deposition plasma process using an ion shower grid
|
3 |
2004
|
| 8,058,156 Plasma immersion ion implantation reactor having multiple ion shower grids
|
0 |
2004
|
| 7,767,561 Plasma immersion ion implantation reactor having an ion shower grid
|
2 |
2004
|
| 7,479,456 Gasless high voltage high contact force wafer contact-cooling electrostatic chuck
|
2 |
2004
|
| 7,666,464 RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor
|
0 |
2004
|
| 7,183,177 Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement
|
18 |
2004
|
| 7,294,563 Semiconductor on insulator vertical transistor fabrication and doping process
|
12 |
2004
|
| 7,166,524 Method for ion implanting insulator material to reduce dielectric constant
|
12 |
2004
|
| 7,465,478 Plasma immersion ion implantation process
|
2 |
2005
|
| 7,288,491 Plasma immersion ion implantation process
|
8 |
2005
|
| 7,094,670 Plasma immersion ion implantation process
|
16 |
2005
|
| 7,428,915 O-ringless tandem throttle valve for a plasma reactor chamber
|
0 |
2005
|
| 7,422,775 Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing
|
2 |
2005
|
| 7,312,162 Low temperature plasma deposition process for carbon layer deposition
|
7 |
2005
|
| 7,109,098 Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing
|
12 |
2005
|
| 7,429,532 Semiconductor substrate process using an optically writable carbon-containing mask
|
1 |
2005
|
| 7,335,611 Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer
|
8 |
2005
|
| 7,323,401 Semiconductor substrate process using a low temperature deposited carbon-containing hard mask
|
18 |
2005
|
| 7,312,148 Copper barrier reflow process employing high speed optical annealing
|
8 |
2005
|
| 7,291,545 Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage
|
10 |
2005
|
| 7,393,765 Low temperature CVD process with selected stress of the CVD layer on CMOS devices
|
7 |
2007
|
