Inductively coupled plasma sputter chamber with conductive material sputtering capabilities

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5569363
SERIAL NO

08326743

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A shade is disposed on the inner wall of an inductively coupled plasma chamber, covering a protected zone of the wall generally opposite to the inductive coil driving the chamber, preventing accumulation of material sputtered from a wafer in this zone, and thus restricting closed paths for eddy current flow along the chamber wall, improving inductive coupling of electrical power to the plasma in the chamber.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
TOKYO ELECTRON LIMITEDTOKYO5258

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bayer, Robert West Milford, NJ 55 1307
Lantsman, Alexander D Middletown, NY 10 370
Seirmarco, James A Buchanan, NY 2 122

Cited Art Landscape

Patent Info (Count) # Cites Year
 
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