Attenuation of polymer substrate degradation due to ultraviolet radiation

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United States of America Patent

PATENT NO 5571855
SERIAL NO

08451896

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Improved methods and polymer compositions are provided whereby ultraviolet radiation degradation of substrates formed of the compositions is attenuated.In accordance with the invention, ultraviolet scattering and absorbing particles having a particle size in the range of from about 0.001 micrometer to about 0.20 micrometer in diameter are dispersed in at least a surface layer of a polymer substrate.

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Patent Owner(s)

Patent OwnerAddress
HSBC BANK USA NATIONAL ASSOCIATION AS THE SUCCESSOR ADMINISTRATIVE AGENT AND COLLATERAL AGENT425 FIFTH AVENUE ATTENTION ERSHAD SATTAR/DANIEL GONZALEZ NEW YORK NY 10018

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kauffman, James W Edmond, OK 30 253
Palmer, Bruce R Edmond, OK 11 83
Stamatakis, Penelope Aurora, IL 7 67

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