Pattern defect inspection method and apparatus
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United States of America Patent
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-
Nov 12, 1996
Grant Date -
N/A
app pub date -
Aug 23, 1994
filing date -
Aug 24, 1993
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The pattern edge direction in reference image data of an object to be examined is detected, the reference image data is differentiated using a differential operator in a direction along the pattern edge direction, and inspection image data obtained by picking up an image of the object to be inspected is differentiated using the differential operator in the direction along the pattern edge direction. The differential data obtained by the differential processing are compared with the inspection image data, and a pattern defect on the object to be inspected is detected based on the difference between these data.
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