Photomask used by photolithography and a process of producing same
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United States of America Patent
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-
Nov 26, 1996
Issued Date -
N/A
app pub date -
May 19, 1995
filing date -
Jun 21, 1990
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A photomask used by photolithography and a process for producing same which allows a single exposure to make a photomask, thereby simplifying the photomask making process, and facilitating the inspection and correction of photomasks. In addition, the phase shifter using a slanting pattern prevents a pattern from being formed outside a predetermined area. The use of a phase shifter which does not resolve under an optical projection system shields a large size area against an irradiated light, thereby allowing the formation of fine, intricate patterns suitable for use in LSIs.
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