US Patent No: 5,579,147

Number of patents in Portfolio can not be more than 2000

Scanning light exposure apparatus

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Abstract

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A scanning light exposure apparatus comprises illumination optical systems for radiating light beams to a plurality of sub-areas in a pattern area of a mask, a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the sub-areas by the light beams transmitted through the mask onto a photo-sensitive substrate, a diaphragm member arranged at a substantially conjugate position to the photo-sensitive substrate in each illumination optical system for limiting a projection area of the sub-area to the photo-sensitive substrate, scanning means for synchronously scanning said mask and said photo-sensitive substrate substantially transversely to the predetermined direction relative to said projection optical systems and diaphragm control means for changing a width of an aperture of each diaphragm member along a direction transverse to the predetermined direction.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
NIKON CORPORATIONTOKYO4638

International Classification(s)

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  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mori, Susumu Tokyo, JP 50 581
Naraki, Tsuyoshi Tokyo, JP 15 438

Cited Art Landscape

Patent Info (Count) # Cites Year
 
CANON KABUSHIKI KAISHA (3)
* 4,350,431 Projecting device 8 1980
* 5,172,189 Exposure apparatus 18 1991
* 5,359,389 Exposure apparatus including two illuminating systems and exposure process using the same 26 1993
* Cited By Examiner

Patent Citation Ranking

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Patent Info (Count) # Cites Year
 
ASML Netherlands B.V. and ASML Holding N.V. (1)
8,159,647 Lithographic apparatus and device manufacturing method 1 2008
 
NIKON CORPORATION (18)
* 5,729,331 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 42 1995
* 5,715,037 Scanning exposure apparatus 41 1996
* 5,985,496 Exposure method and apparatus 3 1997
* 5,920,378 Projection exposure apparatus 17 1997
* 6,051,842 Illumination optical apparatus with optical integrator 17 1998
6,351,305 Exposure apparatus and exposure method for transferring pattern onto a substrate 9 1998
6,266,131 Exposure apparatus 44 1999
6,556,278 Exposure/imaging apparatus and method in which imaging characteristics of a projection optical system are adjusted 10 2000
6,509,954 Aperture stop having central aperture region defined by a circular ARC and peripheral region with decreased width, and exposure apparatus and method 7 2000
6,480,262 Illumination optical apparatus for illuminating a mask, method of manufacturing and using same, and field stop used therein 11 2000
6,795,169 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 230 2003
7,023,527 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 4 2004
7,088,425 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 9 2005
7,372,543 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 4 2006
7,372,544 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 4 2007
7,956,984 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 1 2008
* 8,384,875 Exposure apparatus, exposure method, and method for producing device 0 2009
* 2010/0079,743 Exposure apparatus, exposure method, and method for producing device 2 2009
 
CARL ZEISS SMS GMBH (2)
* 8,970,951 Mask inspection microscope with variable illumination setting 0 2010
* 2012/0162,755 MASK INSPECTION MICROSCOPE WITH VARIABLE ILLUMINATION SETTING 0 2010
 
MICRONIC LASER SYSTEMS AB (1)
7,460,208 Lithographic apparatus and device manufacturing method 2 2005
 
LSI CORPORATION (1)
7,499,146 Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping 2 2005
 
ASML HOLDING N.V. AND ASML NETHERLANDS B.V. (2)
7,400,382 Light patterning device using tilting mirrors in a superpixel form 5 2005
7,683,300 Using an interferometer as a high speed variable attenuator 0 2006
 
TECHNISCHE UNIVERSITEIT DELFT (1)
7,714,307 Method of designing a projection system, lithographic apparatus and device manufacturing method 0 2006
 
DAINIPPON SCREEN MFG. CO., LTD. (1)
7,728,954 Reflective loop system producing incoherent radiation 1 2006
 
ASML NETHERLANDS B.V. (154)
6,995,830 Lithographic projection apparatus and device manufacturing method 6 2003
7,190,434 Lithographic apparatus and device manufacturing method 2 2004
7,133,118 Lithographic apparatus and device manufacturing method 5 2004
7,081,947 Lithographic apparatus and device manufacturing method 21 2004
7,016,014 Lithographic apparatus and device manufacturing method 0 2004
7,061,586 Lithographic apparatus and device manufacturing method 6 2004
7,094,506 Lithographic apparatus and device manufacturing method 7 2004
6,967,711 Lithographic apparatus and device manufacturing method 17 2004
7,561,251 Lithographic apparatus and device manufacturing method 3 2004
7,053,981 Lithographic apparatus and device manufacturing method 5 2004
7,002,666 Lithographic apparatus and device manufacturing method 1 2004
7,183,566 Lithographic apparatus for manufacturing a device 1 2004
7,385,675 Lithographic apparatus and device manufacturing method 8 2004
7,477,403 Optical position assessment apparatus and method 1 2004
7,123,348 Lithographic apparatus and method utilizing dose control 1 2004
6,989,886 Lithographic apparatus and device manufacturing method 0 2004
7,630,118 Spatial light modulator, method of spatially modulating a radiation beam, lithographic apparatus and device manufacturing method 2 2004
7,016,015 Lithographic apparatus and device manufacturing method 4 2004
7,239,393 Calibration method for a lithographic apparatus and device manufacturing method 0 2004
7,154,587 Spatial light modulator, lithographic apparatus and device manufacturing method 2 2004
7,016,016 Lithographic apparatus and device manufacturing method 1 2004
7,116,403 Lithographic apparatus and device manufacturing method 9 2004
7,158,208 Lithographic apparatus and device manufacturing method 18 2004
7,116,404 Lithographic apparatus and device manufacturing method 5 2004
7,573,574 Lithographic apparatus and device manufacturing method 1 2004
7,259,829 Lithographic apparatus and device manufacturing method 2 2004
7,142,286 Lithographic apparatus and device manufacturing method 1 2004
7,251,020 Lithographic apparatus and device manufacturing method 1 2004
7,538,855 Lithographic apparatus and device manufacturing method 0 2004
7,500,218 Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same 6 2004
7,304,718 Lithographic apparatus and device manufacturing method 0 2004
7,116,402 Lithographic apparatus and device manufacturing method 9 2004
7,079,225 Lithographic apparatus and device manufacturing method 3 2004
7,411,652 Lithographic apparatus and device manufacturing method 5 2004
7,109,498 Radiation source, lithographic apparatus, and device manufacturing method 0 2004
7,177,012 Lithographic apparatus and device manufacturing method 12 2004
7,196,772 Lithographic apparatus and device manufacturing method 2 2004
7,116,398 Lithographic apparatus and device manufacturing method 1 2004
7,388,663 Optical position assessment apparatus and method 5 2004
7,609,362 Scanning lithographic apparatus and device manufacturing method 0 2004
7,170,584 Lithographic apparatus and device manufacturing method 2 2004
7,061,581 Lithographic apparatus and device manufacturing method 2 2004
7,333,177 Lithographic apparatus and device manufacturing method 2 2004
7,391,499 Lithographic apparatus and device manufacturing method 1 2004
7,362,415 Lithographic apparatus and device manufacturing method 3 2004
7,355,677 System and method for an improved illumination system in a lithographic apparatus 0 2004
7,349,068 Lithographic apparatus and device manufacturing method 0 2004
7,180,577 Lithographic apparatus and device manufacturing method utilizing a microlens array at an image plane 1 2004
7,391,676 Ultrasonic distance sensors 1 2004
7,375,795 Lithographic apparatus, device manufacturing method, and device manufactured thereby 0 2004
7,256,867 Lithographic apparatus and device manufacturing method 0 2004
7,230,677 Lithographic apparatus and device manufacturing method utilizing hexagonal image grids 2 2004
7,202,939 Lithographic apparatus and device manufacturing method 3 2004
7,426,076 Projection system for a lithographic apparatus 0 2004
7,459,247 Lithographic apparatus and device manufacturing method 3 2004
7,317,510 Lithographic apparatus and device manufacturing method 6 2004
7,126,672 Lithographic apparatus and device manufacturing method 4 2004
7,756,660 Lithographic apparatus and device manufacturing method 0 2004
7,403,865 System and method for fault indication on a substrate in maskless applications 0 2004
7,274,029 Lithographic apparatus and device manufacturing method 1 2004
7,145,636 System and method for determining maximum operational parameters used in maskless applications 1 2004
7,342,644 Methods and systems for lithographic beam generation 2 2004
7,253,881 Methods and systems for lithographic gray scaling 1 2004
7,242,458 Lithographic apparatus and device manufacturing method utilizing a multiple substrate carrier for flat panel display substrates 6 2005
7,812,930 Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume 1 2005
7,209,216 Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithography 1 2005
7,403,265 Lithographic apparatus and device manufacturing method utilizing data filtering 11 2005
7,728,956 Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data 1 2005
7,330,239 Lithographic apparatus and device manufacturing method utilizing a blazing portion of a contrast device 1 2005
7,209,217 Lithographic apparatus and device manufacturing method utilizing plural patterning devices 1 2005
7,221,514 Variable lens and exposure system 5 2005
7,738,081 Lithographic apparatus and device manufacturing method utilizing a flat panel display handler with conveyor device and substrate handler 1 2005
7,477,772 Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compression 0 2005
7,197,828 Lithographic apparatus and device manufacturing method utilizing FPD chuck Z position measurement 5 2005
7,742,148 Lithographic apparatus and device manufacturing method for writing a digital image 0 2005
7,292,317 Lithographic apparatus and device manufacturing method utilizing substrate stage compensating 4 2005
7,233,384 Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor 4 2005
7,321,416 Lithographic apparatus, device manufacturing method, device manufactured thereby, and controllable patterning device utilizing a spatial light modulator with distributed digital to analog conversion 0 2005
7,538,857 Lithographic apparatus and device manufacturing method utilizing a substrate handler 4 2005
7,408,617 Lithographic apparatus and device manufacturing method utilizing a large area FPD chuck equipped with encoders an encoder scale calibration method 1 2005
7,965,373 Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load 3 2005
7,522,258 Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination 0 2005
7,307,694 Lithographic apparatus, radiation beam inspection device, method of inspecting a beam of radiation and device manufacturing method 0 2005
* 7,251,019 Lithographic apparatus and device manufacturing method utilizing a continuous light beam in combination with pixel grid imaging 0 2005
7,606,430 Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for FPD 1 2005
7,332,733 System and method to correct for field curvature of multi lens array 0 2005
7,830,493 System and method for compensating for radiation induced thermal distortions in a substrate or projection system 1 2005
7,391,503 System and method for compensating for thermal expansion of lithography apparatus or substrate 1 2005
7,081,944 Lithographic projection apparatus and device manufacturing method utilizing two arrays of focusing elements 1 2005
7,626,181 Lithographic apparatus and device manufacturing method 1 2005
7,440,078 Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units 4 2005
7,466,394 Lithographic apparatus and device manufacturing method using a compensation scheme for a patterning array 0 2005
7,656,506 Lithographic apparatus and device manufacturing method utilizing a substrate handler 1 2005
7,388,650 Lithographic apparatus and device manufacturing method 1 2005
7,385,677 Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beam 2 2006
7,714,305 Lithographic apparatus and device manufacturing method 1 2006
7,528,933 Lithographic apparatus and device manufacturing method utilizing a MEMS mirror with large deflection using a non-linear spring arrangement 0 2006
7,508,491 Lithographic apparatus and device manufacturing method utilized to reduce quantization influence of datapath SLM interface to dose uniformity 1 2006
7,948,606 Moving beam with respect to diffractive optics in order to reduce interference patterns 0 2006
8,264,667 Lithographic apparatus and device manufacturing method using interferometric and other exposure 0 2006
7,218,380 Lithographic apparatus and device manufacturing method 10 2006
7,649,676 System and method to form unpolarized light 0 2006
7,936,445 Altering pattern data based on measured optical element characteristics 0 2006
8,896,808 Lithographic apparatus and method 0 2006
7,593,094 Patterning device 0 2006
7,324,186 Lithographic apparatus and device manufacturing method 1 2006
7,548,315 System and method to compensate for critical dimension non-uniformity in a lithography system 0 2006
7,738,077 Patterning device utilizing sets of stepped mirrors and method of using same 0 2006
7,563,562 Lithographic apparatus and device manufacturing method 0 2006
7,626,182 Radiation pulse energy control system, lithographic apparatus and device manufacturing method 0 2006
7,628,875 MEMS device and assembly method 0 2006
8,049,865 Lithographic system, device manufacturing method, and mask optimization method 1 2006
7,239,373 Lithographic apparatus and device manufacturing method 3 2006
7,791,710 System and method for determining maximum operational parameters used in maskless applications 0 2006
7,522,266 Lithographic apparatus and device manufacturing method 1 2006
7,738,079 Radiation beam pulse trimming 0 2006
7,453,551 Increasing pulse-to-pulse radiation beam uniformity 0 2006
7,336,343 Lithographic apparatus and device manufacturing method 0 2006
8,259,285 Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data 0 2006
7,321,417 Spatial light modulator, lithographic apparatus and device manufacturing method 5 2006
7,643,128 Large field of view projection optical system with aberration correctability 3 2006
7,684,009 Lithographic apparatus and device manufacturing method 0 2006
7,965,380 Lithographic apparatus and device manufacturing method 7 2007
7,459,710 Lithographic apparatus, method for calibrating and device manufacturing method 0 2007
7,428,040 Lithographic apparatus and device manufacturing method 0 2007
8,009,269 Optimal rasterization for maskless lithography 0 2007
7,826,035 Lithographic apparatus and device manufacturing method 2 2007
8,009,270 Uniform background radiation in maskless lithography 0 2007
8,390,787 Lithographic apparatus and device manufacturing method 0 2007
7,460,309 Variable lens and exposure system 1 2007
7,714,986 Laser beam conditioning system comprising multiple optical paths allowing for dose control 1 2007
8,692,974 Lithographic apparatus and device manufacturing method using pupil filling by telecentricity control 0 2007
8,189,172 Lithographic apparatus and method 0 2007
7,768,627 Illumination of a patterning device based on interference for use in a maskless lithography system 1 2007
7,826,037 Radiation beam pulse trimming 0 2007
7,898,646 Using an interferometer as a high speed variable attenuator 1 2007
7,859,647 Lithographic apparatus and device manufacturing method 1 2008
7,576,834 Lithographic apparatus and device manufacturing method 3 2008
7,894,041 Limiting a portion of a patterning device used to pattern a beam 1 2008
7,864,295 Lithographic apparatus and device manufacturing method utilizing data filtering 2 2008
RE43515 Lithographic apparatus and device manufacturing method 1 2008
8,169,593 Lithographic apparatus and device manufacturing method 0 2008
8,164,740 Illumination system coherence remover with two sets of stepped mirrors 0 2008
8,159,651 Illumination system coherence remover with a series of partially reflective surfaces 0 2008
7,911,586 Lithographic apparatus and device manufacturing method 0 2009
8,937,705 Lithographic apparatus and device manufacturing method with radiation beam inspection using moveable reflecting device 0 2009
8,502,954 Lithographic apparatus and device manufacturing method 0 2009
8,395,755 Lithographic apparatus and device manufacturing method 1 2009
7,826,672 Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for FPD 0 2009
8,411,252 Lithographic apparatus and device manufacturing method utilizing a substrate handler 0 2009
8,003,308 Lithographic apparatus and device manufacturing method for writing a digital image 1 2010
8,508,715 Lithographic apparatus and device manufacturing method utilizing data filtering 0 2010
RE45284 Lithographic apparatus and device manufacturing method 0 2013
8,675,175 Lithographic apparatus and device manufacturing method 0 2013
 
Tropel Corporation (1)
* 5,982,475 Raster-scan photolithographic reduction system 24 1997
 
ASML US, LLC (1)
7,242,456 System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions 1 2004
 
ASML HOLDING N.V. (56)
6,989,920 System and method for dose control in a lithographic system 1 2003
7,061,591 Maskless lithography systems and methods utilizing spatial light modulator arrays 10 2003
7,110,082 Optical system for maskless lithography 2 2003
7,410,736 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones 6 2003
7,414,701 Method and systems for total focus deviation adjustments on maskless lithography systems 2 2003
7,012,674 Maskless optical writer 3 2004
7,580,559 System and method for calibrating a spatial light modulator 8 2004
7,153,616 System and method for verifying and controlling the performance of a maskless lithography tool 2 2004
7,158,215 Large field of view protection optical system with aberration correctability for flat panel displays 9 2004
6,963,434 System and method for calculating aerial image of a spatial light modulator 7 2004
7,528,963 Method and system for wavefront measurements of an optical system 0 2004
7,408,651 Method and system for wavefront measurements of an optical system 0 2004
7,335,398 Method to modify the spatial response of a pattern generator 0 2004
7,227,613 Lithographic apparatus having double telecentric illumination 1 2004
7,102,733 System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool 3 2004
7,405,802 Large field of view 2X magnification projection optical system for FPD manufacture 1 2004
6,985,280 Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography 2 2004
6,965,436 System and method for calibrating a spatial light modulator array using shearing interferometry 9 2004
7,643,192 Pattern generator using a dual phase step element and method of using same 0 2004
7,713,667 System and method for generating pattern data used to control a pattern generator 0 2004
7,274,502 System, apparatus and method for maskless lithography that emulates binary, attenuating phase-shift and alternating phase-shift masks 0 2004
7,279,110 Method and apparatus for creating a phase step in mirrors used in spatial light modulator arrays 0 2004
7,567,368 Systems and methods for minimizing scattered light in multi-SLM maskless lithography 1 2005
7,542,013 System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode 1 2005
7,286,137 Method and system for constrained pixel graytones interpolation for pattern rasterization 0 2005
7,133,121 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 6 2005
7,158,238 System and method for calibrating a spatial light modulator array using shearing interferometry 3 2005
7,394,584 System and method for calculating aerial image of a spatial light modulator 1 2005
7,046,413 System and method for dose control in a lithographic system 3 2005
7,423,732 Lithographic apparatus and device manufacturing method utilizing placement of a patterning device at a pupil plane 3 2005
7,372,614 Method of using deformable mirror using piezoelectric actuators formed as an integrated circuit 1 2005
7,365,848 System and method using visible and infrared light to align and measure alignment patterns on multiple layers 1 2005
7,463,402 Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography 0 2006
7,403,266 Maskless lithography systems and methods utilizing spatial light modulator arrays 0 2006
7,548,301 Maskless optical writer 0 2006
7,532,403 Optical system for transforming numerical aperture 1 2006
7,839,487 Optical system for increasing illumination efficiency of a patterning device 0 2006
7,777,862 Optical system for increasing illumination efficiency of a patterning device 0 2006
8,934,084 System and method for printing interference patterns having a pitch in a lithography system 0 2006
7,589,819 Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems 3 2006
7,697,115 Resonant scanning mirror 0 2006
7,630,136 Optical integrators for lithography systems and methods 0 2006
8,054,449 Enhancing the image contrast of a high resolution exposure tool 2 2006
7,965,378 Optical system and method for illumination of reflective spatial light modulators in maskless lithography 2 2007
7,520,626 Pattern generator using a dual phase step element and method of using same 4 2007
7,354,169 Pattern generator using a dual phase step element and method of using same 4 2007
7,777,861 Methods, systems, and computer program products for printing patterns on photosensitive surfaces 0 2007
7,894,140 Compensation techniques for fluid and magnetic bearings 0 2007
7,773,199 Methods and systems to compensate for a stitching disturbance of a printed pattern 0 2007
7,630,054 Methods and systems to compensate for a stitching disturbance of a printed pattern 0 2007
7,889,411 System and method for calculating aerial image of a spatial light modulator 0 2008
7,768,653 Method and system for wavefront measurements of an optical system 0 2008
7,688,423 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones 0 2008
7,859,756 Optical system for transforming numerical aperture 1 2009
7,859,735 Systems and methods for minimizing scattered light in multi-SLM maskless lithography 1 2009
8,634,064 Optical system for increasing illumination efficiency of a patterning device by producing a plurality of beams 0 2010
* Cited By Examiner