Method for fabricating a planar dielectric

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United States of America Patent

PATENT NO 5583078
SERIAL NO

08469737

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Abstract

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Re-entrant angles in doped dielectrics produced from the decomposition of organo-silicon compounds are reduced or eliminated by the addition of a polar molecule to the dielectric deposition process.

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Patent Owner(s)

Patent OwnerAddress
LUCENT TECHNOLOGIES INC600 MOUNTAIN AVENUE MURARY HILL NJ 07974-0636

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Osenbach, John W Kutztown, PA 74 765

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