Apparatus and method for inspection of a patterned object by comparison thereof to a reference
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United States of America Patent
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Dec 17, 1996
Issued Date -
N/A
app pub date -
Apr 21, 1992
filing date -
Dec 4, 1990
priority date (Note) -
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status (Latency Note)
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Abstract
The present invention seeks to provide an improved system for inspection of and detection of defects in objects such as reticles, photomasks, semiconductor wafers, flat panel displays and other patterned objects. Preferably, the system has two or more stages, whereby the object is examined separately for fine defects, preferably by inspecting a binary level representation of the object, and for ultra fine defects, preferably by inspecting a gray level representation of the object. The system also preferably includes reinspection apparatus for reinspection of detected defects, thereby to reduce the false alarm rate, and for classifying the remaining defects by size, area and type.
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