Photocurable resins for stereolithography and compositions containing same
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United States of America Patent
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Jan 7, 1997
Grant Date -
N/A
app pub date -
Oct 30, 1995
filing date -
Dec 28, 1994
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Photocurable resins containing unsaturated urethane of a specified form and vinyl monomer which is N-(meth)acryloylmorpholine or its mixture with di-ol di(meth)acrylate at a rate within a specified range and compositions containing such a resin and a filler such as solid particles and/or inorganic whiskers of specified kinds at a specified rate are capable of yielding stereolithographed objects with improved mechanical and thermal properties and form precision.
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