Radio-frequency plasma source
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United States of America Patent
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Jan 7, 1997
Grant Date -
N/A
app pub date -
Oct 17, 1995
filing date -
Oct 21, 1994
priority date (Note) -
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status (Latency Note)
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Abstract
A plasma source is described, comprising a discharge chamber (1) bounded by a base wall (5) and by a lateral wall (3), a system (7) for the admission of gas into said discharge chamber, a system of electrodes (13, 15) which are associated with said discharge chamber (1) and which are connected to a radio-frequency generator (17), and which apply an oscillating electric field within the discharge chamber, and means (9, 11) for generating a static magnetic field in said discharge chamber. Coaxially with said discharge chamber (1) there are disposed a first and a second electrode (15; 13; 13X), at least one of which has an annular extent and is disposed in an intermediate position along the axial extent of the discharge chamber, said two electrodes (15; 13; 13X) being connected to two poles of the radio-frequency generator.
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