Photoreaction quenchers in on-press developable lithographic printing plates
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United States of America Patent
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Feb 4, 1997
Grant Date -
N/A
app pub date -
Apr 28, 1995
filing date -
Apr 28, 1995
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The present invention provides a lithographic printing plate comprising a substrate and a photocurable polymeric photoresist, such as those based on free-radical initiated photocuring mechanisms. To constrain detrimental and undesired activity of excess free radicals, an embodiment of the printing plate is further provided with a free-radical regulating system. In a particular embodiment, the free-radical regulating system is provided as an overcoat, the overcoat being a light-transmissive overcoat and comprising a polymer having a pendant free-radical trapping group. A particular polymer for the overcoat has the formula ##STR1## wherein, m is from approximately 20% by weight to approximately 95% by weight, and n is from approximately 0% by weight to approximately 75% by weight. Capable of deactivating free-radicals actinically generated in the photoresist subsequent to exposure, the polymer is soluble in fountain or ink solution and incompatible with the photoresist.
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