Immersion type projection exposure apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 11, 1997
Issued Date -
N/A
app pub date -
Jun 5, 1995
filing date -
Nov 27, 1992
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A projection exposure apparatus includes an illuminating device for illuminating a pattern of an original, a holder for holding a substrate, and a projection system for projecting an image of the pattern of the original onto the substrate. The projection system includes a projection optical system and a plane optical element spaced from the projection optical system and disposed opposite to the surface of the substrate. Also provided is a casing having a filled interspace formed between the optical element and the substrate, with the optical element providing an upper cover of the casing.
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Cited Art Landscape
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