Redox reagent-containing post-etch residue cleaning composition
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 18, 1997
Grant Date -
N/A
app pub date -
Jul 7, 1995
filing date -
Jul 7, 1995
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A noncorrosive post-etch residue cleaning composition containing: (a) 1-70% by weight of an organic polar solvent having a dipole moment of more than 3.5; (b) 1-70% by weight of selected amine compounds having at least one hydroxyl group and a boiling point higher than 150.degree. C. at atmospheric pressure; (c) 0.1-10% by weight of selected amino acid having at least one hydroxyl group; (d) 1-20% by weight of selected redox reagent having a redox potential in the range between +1.0 V and -2.0 V vs. SHE (at pH=7); and (e) 0-90% by weight of water.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully