Method for fabricating active substrate
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United States of America Patent
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Apr 22, 1997
Issued Date -
N/A
app pub date -
Jul 11, 1994
filing date -
Apr 20, 1988
priority date (Note) -
Expired
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Abstract
A method for fabricating an active matrix substrate for forming constituent elements such as a semiconductor layer, a passivation layer, an electrode material and other elements, uses a photoresist exposed from the reverse side of the substrate, using the gate electrode pattern made of opaque material on a transparent substrate as the mask. This method contributes to lowering the cost and improving the performance of semiconductor devices.
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