Surface treatment of polishing cloth

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 5626509
SERIAL NO

08395310

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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An apparatus for surface treatment of polishing cloth includes a rotary cloth mounting section on which a polishing cloth is to be attached, and a rotary surface treatment tool made of an inorganic material other than metal and having at least a protrusion with an irregular surface portion on the surface thereof. The surface treatment tool and the cloth mounting section is rotated and a position of a rotation axis of a first rotating unit is different from that of a rotation axis of a second rotating unit. The rotating surface treatment tool is pressed against the cloth mounting section with a predetermined pressure while the surface treatment and cloth mounting sections are rotated.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
NEC CORPORATIONTOKYO10438

International Classification(s)

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  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hayashi, Yoshihiro Tokyo, JP 239 2774

Cited Art Landscape

Patent Info (Count) # Cites Year
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
* 5036630 Radial uniformity control of semiconductor wafer polishing 85 1990
 
YALE UNIVERSITY (1)
5315308 Method for eletromagnetic source localization 10 1992
 
SPEEDFAM-IPEC CORPORATION (1)
* 5486131 Device for conditioning polishing pads 151 1994
 
INTEL CORPORATION (1)
* 5081051 Method for conditioning the surface of a polishing pad 153 1990
 
MICRON TECHNOLOGY, INC. (1)
* 5216843 Polishing pad conditioning apparatus for wafer planarization process 280 1992
 
MITSUBISHI MATERIALS CORPORATION (1)
* 5421768 Abrasive cloth dresser 82 1994
 
TEXAS INSTRUMENTS INCORPORATED (1)
* 5291693 Semiconductors structure precision lapping method and system 23 1992
 
EBARA CORPORATION (1)
* 5384986 Polishing apparatus 72 1993
 
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (1)
* 4728552 Substrate containing fibers of predetermined orientation and process of making the same 76 1984
* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
Other [Check patent profile for assignment information] (1)
* 2008/0085,662 Polishing tool and polishing method and apparatus using same 1 2007
 
SPEEDFAM-IPEC CORPORATION (1)
* 6283836 Non-abrasive conditioning for polishing pads 5 1999
 
MEMC ELECTRONIC MATERIALS, INC. (1)
* 6120350 Process for reconditioning polishing pads 7 1999
 
DISCO CORPORATION (3)
7713107 Polishing tool 1 2002
* 2002/0173,244 Polishing tool and polishing method and apparatus using same 3 2002
7736215 Polishing tool and polishing method and apparatus using same 0 2007
 
MICRON TECHNOLOGY, INC. (3)
7094695 Apparatus and method for conditioning a polishing pad used for mechanical and/or chemical-mechanical planarization 1 2002
* 2004/0038,534 Apparatus and method for conditioning a polishing pad used for mechanical and/or chemical-mechanical planarization 0 2002
* 7077722 Systems and methods for actuating end effectors to condition polishing pads used for polishing microfeature workpieces 0 2004
 
SAINT-GOBAIN CERAMICS & PLASTICS, INC. (1)
* 2008/0271,384 CONDITIONING TOOLS AND TECHNIQUES FOR CHEMICAL MECHANICAL PLANARIZATION 27 2007
 
TERA XTAL TECHNOLOGY CORPORATION (1)
* 9457450 Pad conditioning tool 0 2014
 
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (2)
* 6857942 Apparatus and method for pre-conditioning a conditioning disc 4 2000
* 6514127 Conditioner set for chemical-mechanical polishing station 1 2000
 
SAMSUNG ELECTRONICS CO., LTD. (3)
* 6893336 Polishing pad conditioner and chemical-mechanical polishing apparatus having the same 8 2003
* 8597081 Chemical mechanical polishing apparatus having pad conditioning disk and pre-conditioner unit 1 2011
* 2012/0083,189 CHEMICAL MECHANICAL POLISHING APPARATUS HAVING PAD CONDITIONING DISK AND PRE-CONDITIONER UNIT 1 2011
 
NORTH STAR INNOVATIONS INC. (1)
* 5961373 Process for forming a semiconductor device 44 1997
 
YAMAHA CORPORATION (1)
* 5902173 Polishing machine with efficient polishing and dressing 71 1997
 
SAINT-GOBAIN ABRASIVES, INC. (4)
8905823 Corrosion-resistant CMP conditioning tools and methods for making and using same 3 2010
* 8951099 Chemical mechanical polishing conditioner 1 2010
* 2012/0220,205 Chemical Mechanical Polishing Conditioner 3 2010
9022840 Abrasive tool for use as a chemical mechanical planarization pad conditioner 0 2012
 
RENESAS TECHNOLOGY CORP. (1)
* 6890857 Semiconductor device having a multilayer wiring structure and pad electrodes protected from corrosion, and method for fabricating the same 0 2002
 
ENTEGRIS, INC. (2)
* 9132526 Chemical mechanical planarization conditioner 0 2012
9616547 Chemical mechanical planarization pad conditioner 0 2015
 
FUJIMORI TECHNICAL LABORATORY INC. (1)
* 6001008 Abrasive dresser for polishing disc of chemical-mechanical polisher 91 1999
 
KABUSHIKI KAISHA TOSHIBA (2)
* 6098638 Method of manufacturing a semiconductor device and an apparatus for manufacturing the same 8 1996
6432257 Dresser for polishing cloth and method for manufacturing such dresser and polishing apparatus 3 1998
 
AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. (1)
* 5868608 Subsonic to supersonic and ultrasonic conditioning of a polishing pad in a chemical mechanical polishing apparatus 61 1996
 
CANON KABUSHIKI KAISHA (1)
* 5735729 Abrasive composition with an electrolytic water and a polishing process with the use of said abrasive composition 9 1994
 
EHWA DIAMOND INDUSTRIAL CO., LTD. (1)
* 2014/0154,956 Pad Conditioning and Wafer Retaining Ring and Manufacturing Method Thereof 0 2013
 
OKI SEMICONDUCTOR CO., LTD. (1)
* 6682405 Polishing apparatus having a dresser and dresser adjusting method 1 2001
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
* 6254461 Process of dressing glass disk polishing pads using diamond-coated dressing disks 12 2000
 
ARACA, INC. (1)
* 2010/0203,811 METHOD AND APPARATUS FOR ACCELERATED WEAR TESTING OF AGGRESSIVE DIAMONDS ON DIAMOND CONDITIONING DISCS IN CMP 18 2009
 
NOVELLUS SYSTEMS, INC. (1)
* 5885147 Apparatus for conditioning polishing pads 51 1997
 
LSI LOGIC CORPORATION (1)
6168502 Subsonic to supersonic and ultrasonic conditioning of a polishing pad in a chemical mechanical polishing apparatus 11 1998
 
KINIK COMPANY (3)
* 9259822 Chemical mechanical polishing conditioner and manufacturing methods thereof 0 2014
* 2014/0273,772 CHEMICAL MECHANICAL POLISHING CONDITIONER AND MANUFACTURING METHODS THEREOF 1 2014
* 9067302 Segment-type chemical mechanical polishing conditioner and method for manufacturing thereof 0 2014
 
IV TECHNOLOGIES CO., LTD. (2)
* 8517800 Polishing pad and fabricating method thereof 0 2008
* 2009/0181,608 POLISHING PAD AND FABRICATING METHOD THEREOF 4 2008
 
GLOBALFOUNDRIES INC. (1)
* 5785585 Polish pad conditioner with radial compensation 52 1995
 
NIKON RESEARCH CORPORATION OF AMERICA (2)
* 6302770 In-situ pad conditioning for CMP polisher 12 1998
6733370 In-situ pad conditioning apparatus for CMP polisher 3 2001
 
EBARA CORPORATION (2)
* 6364752 Method and apparatus for dressing polishing cloth 6 1997
6905400 Method and apparatus for dressing polishing cloth 5 2002
 
I C MIC-Process, Inc. (1)
* 5868609 Wafer carrier rotating head assembly for chemical-mechanical polishing apparatus 6 1997
 
INTEL CORPORATION (3)
* 6402883 Polishing pad conditioning surface having integral conditioning points 4 1999
* 7097542 Method and apparatus for conditioning a polishing pad 0 2004
* 7175510 Method and apparatus for conditioning a polishing pad 3 2005
 
APPLIED MATERIALS, INC. (17)
* 6036583 Conditioner head in a substrate polisher and method 20 1997
* 6135868 Groove cleaning device for chemical-mechanical polishing 25 1998
* 6033290 Chemical mechanical polishing conditioner 20 1998
6217430 Pad conditioner cleaning apparatus 11 1998
6358124 Pad conditioner cleaning apparatus 14 1998
* 6159087 End effector for pad conditioning 40 1999
* 6509269 Elimination of pad glazing for Al CMP 6 1999
6293853 Conditioner apparatus for chemical mechanical polishing 17 2000
6299511 Chemical mechanical polishing conditioner 8 2000
6371836 Groove cleaning device for chemical-mechanical polishing 12 2000
6551176 Pad conditioning disk 29 2000
6386963 Conditioning disk for conditioning a polishing pad 11 2000
7367872 Conditioner disk for use in chemical mechanical polishing 3 2003
* 2004/0203,325 Conditioner disk for use in chemical mechanical polishing 19 2003
* 7066795 Polishing pad conditioner with shaped abrasive patterns and channels 43 2004
* 2006/0079,160 POLISHING PAD CONDITIONER WITH SHAPED ABRASIVE PATTERNS AND CHANNELS 23 2004
* 2008/0014,845 CONDITIONING DISK HAVING UNIFORM STRUCTURES 12 2007
 
TEXAS INSTRUMENTS INCORPORATED (1)
* 5851138 Polishing pad conditioning system and method 47 1997
 
FUJIKOSHI MACHINERY CORP. (1)
* 6705929 Cloth cleaning device and polishing machine 4 2000
 
PROMOS TECHNOLOGIES INC. (3)
* 6042457 Conditioner assembly for a chemical mechanical polishing apparatus 18 1998
6322429 Conditioner assembly and a conditioner back support for a chemical mechanical polishing apparatus 0 2000
* 6306022 Chemical-mechanical polishing device 3 2000
 
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (1)
* 5769697 Method and apparatus for polishing semiconductor substrate 49 1996
* Cited By Examiner