US Patent No: 5,626,509

Number of patents in Portfolio can not be more than 2000

Surface treatment of polishing cloth

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Importance

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Abstract

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An apparatus for surface treatment of polishing cloth includes a rotary cloth mounting section on which a polishing cloth is to be attached, and a rotary surface treatment tool made of an inorganic material other than metal and having at least a protrusion with an irregular surface portion on the surface thereof. The surface treatment tool and the cloth mounting section is rotated and a position of a rotation axis of a first rotating unit is different from that of a rotation axis of a second rotating unit. The rotating surface treatment tool is pressed against the cloth mounting section with a predetermined pressure while the surface treatment and cloth mounting sections are rotated.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
NEC CORPORATIONTOKYO18772

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hayashi, Yoshihiro Narashino, JP 303 1935

Cited Art Landscape

Patent Info (Count) # Cites Year
 
EBARA CORPORATION (1)
5,384,986 Polishing apparatus 72 1993
 
INTEL CORPORATION (1)
5,081,051 Method for conditioning the surface of a polishing pad 153 1990
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
5,036,630 Radial uniformity control of semiconductor wafer polishing 85 1990
 
MICRON TECHNOLOGY, INC. (1)
5,216,843 Polishing pad conditioning apparatus for wafer planarization process 271 1992
 
MITSUBISHI MATERIALS CORPORATION (1)
5,421,768 Abrasive cloth dresser 74 1994
 
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (1)
4,728,552 Substrate containing fibers of predetermined orientation and process of making the same 76 1984
 
SPEEDFAM-IPEC CORPORATION (1)
5,486,131 Device for conditioning polishing pads 137 1994
 
TEXAS INSTRUMENTS INCORPORATED (1)
5,291,693 Semiconductors structure precision lapping method and system 23 1992
 
YALE UNIVERSITY (1)
5,315,308 Method for eletromagnetic source localization 10 1992

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
APPLIED MATERIALS, INC. (14)
6,036,583 Conditioner head in a substrate polisher and method 17 1997
6,135,868 Groove cleaning device for chemical-mechanical polishing 24 1998
6,033,290 Chemical mechanical polishing conditioner 20 1998
6,217,430 Pad conditioner cleaning apparatus 11 1998
6,358,124 Pad conditioner cleaning apparatus 13 1998
6,159,087 End effector for pad conditioning 22 1999
6,509,269 Elimination of pad glazing for Al CMP 5 1999
6,293,853 Conditioner apparatus for chemical mechanical polishing 14 2000
6,299,511 Chemical mechanical polishing conditioner 8 2000
6,371,836 Groove cleaning device for chemical-mechanical polishing 10 2000
6,551,176 Pad conditioning disk 17 2000
6,386,963 Conditioning disk for conditioning a polishing pad 6 2000
7,367,872 Conditioner disk for use in chemical mechanical polishing 2 2003
7,066,795 Polishing pad conditioner with shaped abrasive patterns and channels 25 2004
 
INTEL CORPORATION (3)
6,402,883 Polishing pad conditioning surface having integral conditioning points 4 1999
7,097,542 Method and apparatus for conditioning a polishing pad 0 2004
7,175,510 Method and apparatus for conditioning a polishing pad 3 2005
 
DISCO CORPORATION (2)
7,713,107 Polishing tool 1 2002
7,736,215 Polishing tool and polishing method and apparatus using same 0 2007
 
EBARA CORPORATION (2)
6,364,752 Method and apparatus for dressing polishing cloth 4 1997
6,905,400 Method and apparatus for dressing polishing cloth 2 2002
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (2)
5,785,585 Polish pad conditioner with radial compensation 50 1995
6,254,461 Process of dressing glass disk polishing pads using diamond-coated dressing disks 7 2000
 
KABUSHIKI KAISHA TOSHIBA (2)
6,098,638 Method of manufacturing a semiconductor device and an apparatus for manufacturing the same 8 1996
6,432,257 Dresser for polishing cloth and method for manufacturing such dresser and polishing apparatus 2 1998
 
LSI LOGIC CORPORATION (2)
5,868,608 Subsonic to supersonic and ultrasonic conditioning of a polishing pad in a chemical mechanical polishing apparatus 60 1996
6,168,502 Subsonic to supersonic and ultrasonic conditioning of a polishing pad in a chemical mechanical polishing apparatus 9 1998
 
MICRON TECHNOLOGY, INC. (2)
7,094,695 Apparatus and method for conditioning a polishing pad used for mechanical and/or chemical-mechanical planarization 1 2002
7,077,722 Systems and methods for actuating end effectors to condition polishing pads used for polishing microfeature workpieces 0 2004
 
NIKON RESEARCH CORPORATION OF AMERICA (2)
6,302,770 In-situ pad conditioning for CMP polisher 11 1998
6,733,370 In-situ pad conditioning apparatus for CMP polisher 2 2001
 
PROMOS TECHNOLOGIES INC. (2)
6,042,457 Conditioner assembly for a chemical mechanical polishing apparatus 18 1998
6,322,429 Conditioner assembly and a conditioner back support for a chemical mechanical polishing apparatus 0 2000
 
SAMSUNG ELECTRONICS CO., LTD. (2)
6,893,336 Polishing pad conditioner and chemical-mechanical polishing apparatus having the same 5 2003
8,597,081 Chemical mechanical polishing apparatus having pad conditioning disk and pre-conditioner unit 0 2011
 
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (2)
6,857,942 Apparatus and method for pre-conditioning a conditioning disc 3 2000
6,514,127 Conditioner set for chemical-mechanical polishing station 1 2000
 
CANON KABUSHIKI KAISHA (1)
5,735,729 Abrasive composition with an electrolytic water and a polishing process with the use of said abrasive composition 8 1994
 
FREESCALE SEMICONDUCTOR, INC. (1)
5,961,373 Process for forming a semiconductor device 32 1997
 
FUJIKOSHI MACHINERY CORP. (1)
6,705,929 Cloth cleaning device and polishing machine 3 2000
 
FUJIMORI TECHNICAL LABORATORY INC. (1)
6,001,008 Abrasive dresser for polishing disc of chemical-mechanical polisher 79 1999
 
I C MIC-Process, Inc. (1)
5,868,609 Wafer carrier rotating head assembly for chemical-mechanical polishing apparatus 6 1997
 
IV TECHNOLOGIES CO., LTD. (1)
8,517,800 Polishing pad and fabricating method thereof 0 2008
 
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (1)
5,769,697 Method and apparatus for polishing semiconductor substrate 42 1996
 
MEMC ELECTRONIC MATERIALS, INC. (1)
6,120,350 Process for reconditioning polishing pads 7 1999
 
NOVELLUS SYSTEMS, INC. (1)
5,885,147 Apparatus for conditioning polishing pads 50 1997
 
OKI SEMICONDUCTOR CO., LTD. (1)
6,682,405 Polishing apparatus having a dresser and dresser adjusting method 1 2001
 
QIMONDA AG (1)
6,306,022 Chemical-mechanical polishing device 3 2000
 
RENESAS TECHNOLOGY CORP. (1)
6,890,857 Semiconductor device having a multilayer wiring structure and pad electrodes protected from corrosion, and method for fabricating the same 0 2002
 
SPEEDFAM-IPEC CORPORATION (1)
6,283,836 Non-abrasive conditioning for polishing pads 3 1999
 
TEXAS INSTRUMENTS INCORPORATED (1)
5,851,138 Polishing pad conditioning system and method 31 1997
 
YAMAHA CORPORATION (1)
5,902,173 Polishing machine with efficient polishing and dressing 57 1997