US Patent No: 5,626,509

Number of patents in Portfolio can not be more than 2000

Surface treatment of polishing cloth

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Importance

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Abstract

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An apparatus for surface treatment of polishing cloth includes a rotary cloth mounting section on which a polishing cloth is to be attached, and a rotary surface treatment tool made of an inorganic material other than metal and having at least a protrusion with an irregular surface portion on the surface thereof. The surface treatment tool and the cloth mounting section is rotated and a position of a rotation axis of a first rotating unit is different from that of a rotation axis of a second rotating unit. The rotating surface treatment tool is pressed against the cloth mounting section with a predetermined pressure while the surface treatment and cloth mounting sections are rotated.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
NEC CORPORATIONTOKYO9491

International Classification(s)

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  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hayashi, Yoshihiro Tokyo, JP 221 1826

Cited Art Landscape

Patent Info (Count) # Cites Year
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
* 5,036,630 Radial uniformity control of semiconductor wafer polishing 85 1990
 
YALE UNIVERSITY (1)
5,315,308 Method for eletromagnetic source localization 10 1992
 
SPEEDFAM-IPEC CORPORATION (1)
* 5,486,131 Device for conditioning polishing pads 141 1994
 
INTEL CORPORATION (1)
* 5,081,051 Method for conditioning the surface of a polishing pad 153 1990
 
MICRON TECHNOLOGY, INC. (1)
* 5,216,843 Polishing pad conditioning apparatus for wafer planarization process 272 1992
 
MITSUBISHI MATERIALS CORPORATION (1)
* 5,421,768 Abrasive cloth dresser 79 1994
 
TEXAS INSTRUMENTS INCORPORATED (1)
* 5,291,693 Semiconductors structure precision lapping method and system 23 1992
 
EBARA CORPORATION (1)
* 5,384,986 Polishing apparatus 72 1993
 
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (1)
* 4,728,552 Substrate containing fibers of predetermined orientation and process of making the same 76 1984
* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
SPEEDFAM-IPEC CORPORATION (1)
* 6,283,836 Non-abrasive conditioning for polishing pads 3 1999
 
MEMC ELECTRONIC MATERIALS, INC. (1)
* 6,120,350 Process for reconditioning polishing pads 7 1999
 
AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. (1)
* 5,868,608 Subsonic to supersonic and ultrasonic conditioning of a polishing pad in a chemical mechanical polishing apparatus 60 1996
 
DISCO CORPORATION (2)
7,713,107 Polishing tool 1 2002
7,736,215 Polishing tool and polishing method and apparatus using same 0 2007
 
MICRON TECHNOLOGY, INC. (2)
7,094,695 Apparatus and method for conditioning a polishing pad used for mechanical and/or chemical-mechanical planarization 1 2002
* 7,077,722 Systems and methods for actuating end effectors to condition polishing pads used for polishing microfeature workpieces 0 2004
 
FREESCALE SEMICONDUCTOR, INC. (1)
* 5,961,373 Process for forming a semiconductor device 35 1997
 
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (2)
* 6,857,942 Apparatus and method for pre-conditioning a conditioning disc 4 2000
* 6,514,127 Conditioner set for chemical-mechanical polishing station 1 2000
 
SAMSUNG ELECTRONICS CO., LTD. (3)
* 6,893,336 Polishing pad conditioner and chemical-mechanical polishing apparatus having the same 8 2003
* 8,597,081 Chemical mechanical polishing apparatus having pad conditioning disk and pre-conditioner unit 0 2011
* 2012/0083,189 CHEMICAL MECHANICAL POLISHING APPARATUS HAVING PAD CONDITIONING DISK AND PRE-CONDITIONER UNIT 0 2011
 
RENESAS TECHNOLOGY CORP. (1)
* 6,890,857 Semiconductor device having a multilayer wiring structure and pad electrodes protected from corrosion, and method for fabricating the same 0 2002
 
SAINT-GOBAIN ABRASIVES, INC (4)
8,905,823 Corrosion-resistant CMP conditioning tools and methods for making and using same 0 2010
* 8,951,099 Chemical mechanical polishing conditioner 0 2010
* 2012/0220,205 Chemical Mechanical Polishing Conditioner 3 2010
9,022,840 Abrasive tool for use as a chemical mechanical planarization pad conditioner 0 2012
 
YAMAHA CORPORATION (1)
* 5,902,173 Polishing machine with efficient polishing and dressing 61 1997
 
Fujimori Technology Laboratory Inc. (1)
* 6,001,008 Abrasive dresser for polishing disc of chemical-mechanical polisher 82 1999
 
KABUSHIKI KAISHA TOSHIBA (2)
* 6,098,638 Method of manufacturing a semiconductor device and an apparatus for manufacturing the same 8 1996
6,432,257 Dresser for polishing cloth and method for manufacturing such dresser and polishing apparatus 2 1998
 
CANON KABUSHIKI KAISHA (1)
* 5,735,729 Abrasive composition with an electrolytic water and a polishing process with the use of said abrasive composition 8 1994
 
OKI SEMICONDUCTOR CO., LTD. (1)
* 6,682,405 Polishing apparatus having a dresser and dresser adjusting method 1 2001
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (2)
* 5,785,585 Polish pad conditioner with radial compensation 50 1995
* 6,254,461 Process of dressing glass disk polishing pads using diamond-coated dressing disks 10 2000
 
LSI LOGIC CORPORATION (1)
6,168,502 Subsonic to supersonic and ultrasonic conditioning of a polishing pad in a chemical mechanical polishing apparatus 10 1998
 
NOVELLUS SYSTEMS, INC. (1)
* 5,885,147 Apparatus for conditioning polishing pads 50 1997
 
KINIK COMPANY (2)
* 2014/0273,772 CHEMICAL MECHANICAL POLISHING CONDITIONER AND MANUFACTURING METHODS THEREOF 0 2014
* 9,067,302 Segment-type chemical mechanical polishing conditioner and method for manufacturing thereof 0 2014
 
IV Technologies Co., Ltd. (2)
* 8,517,800 Polishing pad and fabricating method thereof 0 2008
* 2009/0181,608 POLISHING PAD AND FABRICATING METHOD THEREOF 2 2008
 
NIKON RESEARCH CORPORATION OF AMERICA (2)
* 6,302,770 In-situ pad conditioning for CMP polisher 11 1998
6,733,370 In-situ pad conditioning apparatus for CMP polisher 2 2001
 
EBARA CORPORATION (2)
* 6,364,752 Method and apparatus for dressing polishing cloth 5 1997
6,905,400 Method and apparatus for dressing polishing cloth 3 2002
 
I C MIC-Process, Inc. (1)
* 5,868,609 Wafer carrier rotating head assembly for chemical-mechanical polishing apparatus 6 1997
 
INTEL CORPORATION (3)
* 6,402,883 Polishing pad conditioning surface having integral conditioning points 4 1999
* 7,097,542 Method and apparatus for conditioning a polishing pad 0 2004
* 7,175,510 Method and apparatus for conditioning a polishing pad 3 2005
 
APPLIED MATERIALS, INC. (14)
* 6,036,583 Conditioner head in a substrate polisher and method 18 1997
* 6,135,868 Groove cleaning device for chemical-mechanical polishing 24 1998
* 6,033,290 Chemical mechanical polishing conditioner 20 1998
6,217,430 Pad conditioner cleaning apparatus 11 1998
6,358,124 Pad conditioner cleaning apparatus 13 1998
* 6,159,087 End effector for pad conditioning 28 1999
* 6,509,269 Elimination of pad glazing for Al CMP 5 1999
6,293,853 Conditioner apparatus for chemical mechanical polishing 16 2000
6,299,511 Chemical mechanical polishing conditioner 8 2000
6,371,836 Groove cleaning device for chemical-mechanical polishing 10 2000
6,551,176 Pad conditioning disk 20 2000
6,386,963 Conditioning disk for conditioning a polishing pad 6 2000
7,367,872 Conditioner disk for use in chemical mechanical polishing 3 2003
* 7,066,795 Polishing pad conditioner with shaped abrasive patterns and channels 31 2004
 
TEXAS INSTRUMENTS INCORPORATED (1)
* 5,851,138 Polishing pad conditioning system and method 38 1997
 
Fujikoshi Machinery Corp. (1)
* 6,705,929 Cloth cleaning device and polishing machine 3 2000
 
PROMOS TECHNOLOGIES INC. (3)
* 6,042,457 Conditioner assembly for a chemical mechanical polishing apparatus 18 1998
6,322,429 Conditioner assembly and a conditioner back support for a chemical mechanical polishing apparatus 0 2000
* 6,306,022 Chemical-mechanical polishing device 3 2000
 
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (1)
* 5,769,697 Method and apparatus for polishing semiconductor substrate 46 1996
* Cited By Examiner