Liquid radiation-curable formulation, in particular for use in stereolithography
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United States of America Patent
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May 13, 1997
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May 24, 1995
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Aug 26, 1993
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Abstract
Liquid radiation-curable formulation, in particular for stereolithography, based on at least one compound that contains radically polymerizable groups, and at least one photoinitiator suitable for the polymerization, which formulation additionally contains a polyoxyalkylene-polysiloxane block copolymer that is selected from copolymers of the chemical formulae ##STR1## wherein: R.sup.1 is a hydrogen atom or a C.sub.1 -C.sub.8 alkyl group; R.sup.2 is a methyl or phenyl group; [T] is a polysiloxane group [PS] terminated as described in the specification in more detail; [PS] is the group of formula ##STR2## and [Alk] is an alkylene group of 3 to 10 carbon atoms, as well as novel block copolymers of formulae (I) and (II). The cured formulations have, inter alia, superior impact strength.
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