Exposure apparatus
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United States of America Patent
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May 27, 1997
Grant Date -
N/A
app pub date -
Oct 27, 1995
filing date -
Dec 12, 1994
priority date (Note) -
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Abstract
An exposure apparatus comprises a substrate holding portion for holding a photosensitive substrate including a surface, a substrate stage for two-dimensional positioning of the photosensitive substrate via the substrate holding portion, the substrate stage including an upper surface, and an exposure system for transferring a pattern on a mask to the photosensitive substrate by an exposing illumination light. The substrate holding portion is provided in the substrate stage so that the portion of the upper surface of the substrate stage surrounding the photosensitive substrate is substantially flush with the surface of the photosensitive substrate.
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